Method of manufacturing silicon carbide semiconductor device

A method of manufacturing a silicon carbide semiconductor device, comprising the steps of:

• in a semiconductor stacked substrate including a first conductivity type silicon carbide crystal substrate made from a hexagonal silicon carbide crystal of a first conductivity type, a first conductivity type silicon carbide crystal layer made from a hexagonal silicon carbide crystal of a first conductivity type and formed on said first conductivity type silicon carbide crystal substrate, a second conductivity type silicon carbide crystal layer made from a hexagonal silicon carbide crystal of a second conductivity type and formed on said first conductivity type silicon carbide crystal layer, and a first conductivity type semiconductor region formed in a surface of said second conductivity type silicon carbide crystal layer, forming a trench extending from a surface of said semiconductor stacked substrate through said first conductivity type semiconductor region and said second conductivity type silicon carbide crystal layer into said first conductivity type silicon carbide crystal layer defined as a bottom surface;
• forming a silicon film in at least a part of said trench;
• heating said semiconductor stacked substrate having said silicon film formed to a temperature that is not less than a melting temperature of said silicon film;
• removing heated said silicon film;
• forming a gate insulating film on a surface exposed after said silicon film is removed;
• and
• forming a gate electrode layer on a surface of said gate insulating film.