Method for producing core-shell nanowires, nanowires produced by the method and nanowire device comprising the nanowires
AssigneeSamsung Electronics Co., Ltd.
InventorsEun Kyung Lee, Jai Yong Han, Byoung Lyong Choi, Kyung Sang Cho
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Abstract
Disclosed is a method for producing core-shell nanowires in which an insulating film is previously patterned to block the contacts between nanowire cores and nanowire shells. According to the method, core-shell nanowires whose density and position is controllable can be produced in a simple manner. Further disclosed are nanowires produced by the method and a nanowire device comprising the nanowires. The use of the nanowires leads to an increase in the light emitting/receiving area of the device. Therefore, the device exhibits high luminance/efficiency characteristics.
Claims33
A method for producing core-shell nanowires, the method comprising the steps of:
- (a) forming a metal layer directly on a substrate;
- (b) forming an insulating film on the metal layer;
- (c) patterning the insulating film;
- (d) forming a plurality of nanowire cores in a direction perpendicular to the substrate on areas of the substrate from which portions of the insulating film are removed by the patterning;
- and
- (e) forming first nanowire shells on surfaces of the nanowire cores to produce the core-shell nanowires.
A method for producing core-shell nanowires, the method comprising the steps of
- (a) forming an insulating film on a substrate,
- (b) patterning the insulating
- (c) forming a metal layer on areas of the substrate from which portions of the insulating film are removed by the patterning
- (c) forming a plurality of nanowire cores on the substrate and in a direction perpendicular to the substrate on areas of the substrate from which portions of the insulating film are removed by the patterning;
- and
- (d) forming first nanowire shells on surfaces of the nanowire cores to produce the core-shell nanowires.
A method for producing core-shell nanowires, the method comprising the steps of:
- (a) forming an insulating film on a substrate,
- (b) patterning the insulating film;
- (c) forming a plurality of nanowire cores in a direction perpendicular to the substrate on areas of the substrate from which portions of the insulating film are removed by the patterning;
- (d) forming undoped intrinsic portions as light-emitting layers on surfaces of the nanowire cores;
- and
- (e) forming first nanowire shells on surfaces of the intrinsic portions to produce the core-shell nanowires.
A nanowire device comprising:
- a substrate,
- metal layer on one surface of the substrate,
- an insulating film on a surface of the metal layer,
- a plurality of nanowire cores disposed in a direction perpendicular to the substrate on areas of the substrate from which portions of the insulating film are removed by patterning,
- first nanowire shells disposed on surfaces of the nanowire cores, and
- electrode layers disposed on the first nanowire shells.
A nanowire device comprising:
- a substrate,
- a patterned insulating film disposed on a surface of the substrate,
- a plurality of nanowire cores disposed in a direction perpendicular to the substrate on areas of the substrate from which portions of the insulating film are removed by the patterning,
- a metal layer on the plurality of nanowire cores,
- first nanowire shells disposed on surfaces of the nanowire cores, and
- electrode layers disposed on the first nanowire shells.
A nanowire device comprising:
- a substrate,
- a patterned insulating film disposed on a surface of the substrate,
- a plurality of nanowire cores disposed in a direction perpendicular to the substrate on areas of the substrate from which portions of the insulating film are removed by the patterning,
- undoped intrinsic portions on surfaces of the nanowire cores,
- first nanowire shells disposed on surfaces of the undoped intrinsic portions, and
- electrode layers disposed on the first nanowire shells.
Dependencies are inferred from the claim text.