Method for manufacturing porous structure and method for forming pattern
AssigneeKabushiki Kaisha Toshiba
InventorsKoji Asakawa, Toshiro Hiraoka, Yoshihiro Akasaka, Yasuyuki Hotta
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Abstract
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
Claims9
A method for manufacturing a porous structure comprising:
- forming a molded product comprised of a pattern forming material, wherein the pattern forming material comprises a block copolymer or graft copolymer comprising:
- a polymer chain selected from the group consisting of a polyacrylonitrile chain, a polyacrylonitrile derivative chain, a polycyclohexadiene derivative chain and a polybutadiene chain;
- and
- a thermally decomposable polymer chain;
- forming a microphase-separated structure in the molded product, said microphase-separated structure comprising a thermally decomposable polymer phase and a remaining polymer phase;
- forming a porous structure having the remaining polymer phase by removing the thermally decomposable polymer phase by heating said molded product to a thermal decomposition temperature or more.
Dependencies are inferred from the claim text.