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US 8,039,205 B2Granted
Fluidic MEMS device
AssigneeHewlett-Packard Development Company, L.P.
InventorsChien-Hua Chen, Xia feng Yang
Life of this patent
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Abstract
A method includes depositing a sacrificial material on a substrate, and depositing a polymer layer on the substrate and the sacrificial material. The method further includes removing the sacrificial material to at least partially define boundaries of at least one fluidic channel of a fluidic micro electromechanical system (MEM) device, the at least one fluidic channel is at least partially defined by a portion of the polymer layer and a portion of the substrate.
Claims13
A method comprising:
- depositing a sacrificial material on a substrate;
- depositing a polymer layer on the substrate and the sacrificial material;
- forming a deep cross-linked region of the polymer layer and a shallow cross-linked region of the polymer layer;
- and
- removing the sacrificial material to at least partially define boundaries of at least one fluidic channel of a fluidic micro electromechanical system (MEM) device, the at least one fluidic channel being at least partially defined by the deep cross-linked region and the shallow cross-linked region of the polymer layer and a portion of the substrate.
2 more elements
A method comprising:
- depositing a sacrificial material on a substrate;
- depositing a polymer layer on the substrate and the sacrificial material;
- and
- removing the sacrificial material to at least partially define boundaries of at least one fluidic channel of a fluidic micro electromechanical system (MEM) device, the at least one fluidic channel being at least partially defined by a portion of the polymer layer and a portion of the substrate;
- wherein depositing the polymer layer includes:
- applying strong and weak UV exposures to different areas of the polymer layer to cross-link portions of the polymer layer in deep and shallow manners, respectively.
3 more elements
A method comprising:
- depositing a sacrificial material on a substrate;
- depositing a polymer layer on the substrate and the sacrificial material;
- and
- removing the sacrificial material to at least partially define boundaries of at least one fluidic channel of a fluidic micro electromechanical system (MEM) device, the at least one fluidic channel being at least partially defined by a portion of the polymer layer and a portion of the substrate;
- wherein depositing the polymer layer includes applying a combination of strong direct imaging and weak direct imaging to create, respectively, deep cross-linked and shallow cross-linked regions within the polymer layer to create a unitary polymer layer structure, wherein the combination is based in part on use of a mask and differences in UV exposure.
2 more elements
A method comprising:
- depositing a sacrificial material on a substrate;
- depositing a polymer layer on the substrate and the sacrificial material;
- removing the sacrificial material to at least partially define boundaries of at least one fluidic channel of a fluidic micro electromechanical system (MEM) device, the at least one fluidic channel being at least partially defined by a portion of the polymer layer and a portion of the substrate;
- applying a strong exposure process to portions of the polymer layer through a mask to cross-link the portions of the polymer layer in a deep manner;
- applying a weak exposure process to other portions of the polymer layer through a mask to cross-link the other portions of the polymer layer in a shallow manner;
- and
- developing away un-exposed portions from the polymer layer.
4 more elements
Dependencies are inferred from the claim text.