Two-fluid nozzle for cleaning substrate and substrate cleaning apparatus
AssigneeTokyo Electron Limited
InventorsItaru Kanno, Yusaku Hirota, Kenji Sekiguchi, Hiroshi Nagayasu, Shouichi Shimose
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AssigneeTokyo Electron Limited
InventorsItaru Kanno, Yusaku Hirota, Kenji Sekiguchi, Hiroshi Nagayasu, Shouichi Shimose
Estimating the term…
An object of the present is to uniform particle diameters and speeds of liquid droplets in a two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate. The two-fluid nozzle for cleaning substrates has a gas supply passage for supplying gas, a liquid supply passage for supplying liquid, and a lead-out passage for leading out internally-formed liquid droplets, wherein an injection port for injecting liquid droplets to the outside is formed at the front end of the lead-out passage, and wherein a cross-sectional area Sb of the injection port is formed smaller than a cross-sectional area Sa of the lead-out passage, and a cross sectional area Sc of an exit of the gas supply passage is formed smaller than the cross-sectional area Sa of the lead-out passage.
A two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate, comprising:
A two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid drops with gas so as to clean a substrate, comprising:
Dependencies are inferred from the claim text.