Stationary x-ray target and methods for manufacturing same
AssigneeVarian Medical Systems, Inc.
InventorDavid S. K. Lee
Life of this patent
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Abstract
Stationary x-ray target assemblies manufactured using a metal deposition process to form one or more metal layers of the target. In particular, the metal deposition process is used to form an x-ray target metal layer and/or a stress buffer zone on an x-ray target substrate. The stress buffer zone improves material properties of the metals and/or the bonding between the x-ray target metal layer and the substrate. Improved bonding between the x-ray target metal layer and the substrate also improves the heat dissipation properties of the stationary x-ray target assembly.
Claims21
A method for manufacturing a stationary x-ray target assembly, the method comprising:
- providing an intermediate x-ray target assembly comprising a substrate;
- and
- forming an x-ray target metal layer on at least a portion of the substrate using a electroforming process to yield a stationary x-ray target assembly,
- wherein the x-ray target metal layer is comprised of at least one refractory metal suitable for generating x-rays upon impingement of a stream of electrons.
A method for manufacturing a stationary x-ray target assembly using an electroforming process, comprising:
- providing an electroforming apparatus, an electrolyte, a metal anode comprising a metal, and an electrically conductive cathode, the electrically conductive cathode comprised of at least one electrically conductive intermediate x-ray target assembly;
- and
- forming a metal layer on at least a portion of the intermediate x-ray target assembly by electroforming of at least a portion of the metal from the anode onto the electrically conductive intermediate x-ray target assembly so as to yield a stationary x-ray target assembly,
- wherein the metal layer is suitable for generating x-rays upon impingement of a stream of electrons on the stationary x-ray target assembly.
A stationary x-ray target assembly, comprising:
- an x-ray target substrate comprising a first metal;
- an x-ray target metal layer suitable for generating x-rays upon impingement of a stream of electrons comprising a refractory second metal;
- and
- a buffer zone situated between the x-ray target substrate and the x-ray target metal layer, the buffer zone comprising a layered structure with alternating layers of the first and second metals, wherein the layered structure has layers of the second metal that gradually increase in thickness while simultaneously having layers of the first metal that gradually decrease in thickness.
Dependencies are inferred from the claim text.