Polymer-based pattern mask system and method having enhanced adhesion
AssigneeHewlett-Packard Development Company, L.P.
InventorsA. Marcia Almanza-Workman, Carl P. Taussig
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AssigneeHewlett-Packard Development Company, L.P.
InventorsA. Marcia Almanza-Workman, Carl P. Taussig
Estimating the term…
A polymer-based pattern mask system and methods of masking and patterning a substrate employ an organosilane to enhance adhesion between a pattern mask and the substrate. The substrate is compatible with the organosilane. The methods include applying a coating of the organosilane to a substrate surface and printing a pattern mask on the coated surface using a roll-to-roll printing process. The pattern mask is polymer-based. The organosilane enhances adhesion during printing of the pattern mask. The method of patterning further includes patterning the substrate surface and lifting-off the pattern mask. The organosilane further enhances adhesion during patterning and does not hinder lifting-off the pattern mask. The system includes the pattern mask, the organosilane and a lift-off agent to remove the pattern mask.
A method of masking a substrate, the method comprising:
A method of patterning a substrate, the method comprising:
A polymer-based pattern mask system comprising:
Dependencies are inferred from the claim text.