Substrate treating apparatus and exposing apparatus for cleaning a chuck cleaning tool with treating bath

An exposing apparatus, comprising:

• a treating room providing a space where a substrate treating process is performed;
• a chuck member which is installed on an inside of the treating room and on which a substrate is placed;
• an exposing member irradiating light including an image of a circuit pattern onto a substrate placed on the chuck member;
• a chuck cleaning member which is disposed to be adjacent to the chuck member and includes a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member, wherein the chuck cleaning member comprises:
• a first driving member providing a rotatory power to the cleaning tool;
• a horizontal supporting rod disposed horizontally and having one end, the first driving member being installed at the one end of the horizontal supporting rod;
• a vertical supporting rod which is connected to the other end of the horizontal supporting rod and disposed to be perpendicular to the horizontal supporting rod;
• and
• a second driving member providing a rotatory power to the vertical supporting rod;
• and
• a tool cleaning member cleaning the cleaning tool, wherein the tool cleaning member comprises:
• a treating bath with an opened top providing a space in which the cleaning tool is received;
• a chemical solution supply unit including a chemical solution supply line connected to a chemical solution inflowing hole formed on a wall of the treating bath;
• a rinse solution supply unit including a rinse solution supply line connected to a rinse solution inflowing hole formed on the wall of the treating bath;
• and
• a drain unit including a drain line connected to a drain hole formed on the wall of the treating bath.