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US 8,026,600 B2Granted
Controlled impedance structures for high density interconnections
AssigneeSamsung Electronics Co., Ltd.
InventorsJoseph C. Fjelstad, Kevin P. Grundy
Life of this patent
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Abstract
An interconnection structure suitable for use as an IC package, probe head or other electrical termination of high density where uninterrupted controlled impedance is desired is described.
Claims25
An interconnection device comprising:
- first and second circuit layers, each circuit layer comprising a plurality of conductive circuit paths coupled with a formable insulating layer having a uniform thickness and having first and second surfaces, each conductive circuit path terminating in a fine-pitch terminal at a proximal end and a coarse-pitch terminal at a distal end, wherein each fine-pitch terminal is disposed in a fine-pitch terminal array comprising a plurality of fine-pitch terminals, and each coarse-pitch terminal is disposed in a coarse-pitch terminal array comprising a plurality of coarse-pitch terminals,
- wherein the first circuit layer further comprises a first contiguous metal layer disposed against the second surface of the formable insulating layer,
- wherein the first contiguous metal layer functions as a ground reference layer, and
- wherein the first circuit layer further comprises a second contiguous metal layer separated from the first contiguous metal layer by a dielectric layer of uniform thickness;
- and
- a first insulating adhesive layer disposed between the first and second circuit layers, wherein a section of the first insulating adhesive layer has a non-uniform thickness.
3 more elements
Dependencies are inferred from the claim text.