Sensor device and production method therefor

A sensor device comprising:

• a sensor unit comprising a frame made of a semiconductor material and having an opening, a movable portion held in said opening to be movable relative to said frame, and a detecting portion configured to output an electric signal according to a positional displacement of said movable portion;
• and
• a package substrate made of a semiconductor material, and bonded to a surface of said sensor unit;
• wherein a region of said frame bonded to said package substrate has one of an activated surface of said frame and an activated surface of an electrical insulating film formed on said frame;
• a region of said package substrate bonded to said frame has one of an activated surface of said package substrate and an activated surface of an electrical insulating film formed on said package substrate;
• and
• the bonding between said sensor unit and said package substrate is a solid-phase direct bonding without diffusion between the activated surfaces in the presence of at least one of the electrical insulating films
• wherein at least one of the electrically insulating film formed on said frame and the electrically insulating film formed on said package substrate is composed of a ring-like outer insulating film formed so as to surround said movable portion, and a ring-like inner insulating film formed so as to surround said movable portion at an inner side of said outer insulating film,
• wherein each of the electrically insulating film formed on said frame and the electrically insulating film formed on said package substrate is composed of said outer insulating film, said inner insulating film, and an auxiliary insulating film configured to connect between said outer insulating film and said inner insulating film, which is formed at plural locations spaced from each other by a predetermined distance in a circumferential direction of said inner insulating film, and
• wherein each of a bonding between said outer insulating films, a bonding between said inner insulating films, and a bonding between said auxiliary insulating films is provided by the solid-phase direct bonding.