Image sensor and fabrication method thereof
AssigneeDongbu HiTek Co., Ltd.
InventorJin-Ho Park
Life of this patent
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Abstract
An image sensor and a method of fabricating an image sensor. A method of fabricating an image sensor may include forming a plurality of photodiodes on and/or over a semiconductor substrate, a filter array including color filters arranged corresponding to upper parts of photodiodes, a plurality of hydrophilic lenses arranged over a filter array spaced apart from one another, and/or a plurality of hydrophobic lenses arranged over a filter array between hydrophilic lenses. A curvature of a lens may be substantially equal in a horizontal, vertical and/or diagonal direction.
Claims18
An apparatus comprising:
- a plurality of photodiodes over a semiconductor substrate;
- a filter array comprising color filters over corresponding upper parts of said plurality of photodiodes;
- a plurality of hydrophilic lenses over said filter array spaced apart from one another;
- and
- a plurality of hydrophobic lenses over said filter array between said hydrophilic lenses,
- wherein said plurality of hydrophilic lenses and said plurality of hydrophobic lenses are formed from the same material.
A method comprising:
- forming a plurality of photodiodes over a semiconductor substrate;
- forming a filter array comprising color filters over corresponding upper parts of said plurality of photodiodes;
- forming a plurality of hydrophilic lenses over said filter array spaced apart from one another;
- and
- forming a plurality of hydrophobic lenses over said filter array between said hydrophilic lenses,
- wherein forming said plurality of hydrophilic lenses comprises:
- vapor-depositing a photoresist over said filter array;
- forming a mask pattern over the photoresist in the form of separated lenses;
- and
- forming a lens pattern at a lower part of said mask pattern by etching using said mask pattern such that said lens pattern is surface-modified to comprise a hydrophilic surface.
A method comprising:
- forming a plurality of photodiodes over a semiconductor substrate;
- forming a filter array comprising color filters over corresponding upper parts of said plurality of photodiodes;
- forming a first hydrophobic photoresist over said filter array;
- forming a mask pattern having a checkerboard form over said filter array;
- performing etching using said mask pattern to form a plurality of hydrophilic lenses spaced apart from one another having said checkerboard form;
- and
- forming a plurality of hydrophobic lenses over relatively thin photoresists formed between said plurality of hydrophilic lenses.
Dependencies are inferred from the claim text.