Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials

A composition of matter, comprising:

• one or more monomers, each monomer consisting of a polyhedral silsesquioxane oligomer, each polyhedral silsesquioxane oligomer having one or more polymerizable groups, wherein each of said one or more polymerizable group is bound to a different silicon atom of a respective polyhedral silsesquioxane oligomer;
• one or more polymerizable monomeric diluents, said monomeric diluents constituting at least 50% by weight of the composition;
• (a) one or more photoacid generators, (b) one or more photoinitiators, or (c) a mixture of one or more photoacid generators and said one or more photoinitiators;
• and
• wherein at least one monomer of said one or more monomers has the structure:
• and wherein each R group is independently selected from the group consisting of:

A composition of matter, comprising:

• one or more monomers, each monomer consisting of a polyhedral silsesquioxane oligomer, each polyhedral silsesquioxane oligomer having one or more polymerizable groups, wherein each of said one or more polymerizable group is bound to a different silicon atom of a respective polyhedral silsesquioxane oligomer;
• one or more polymerizable monomeric diluents, said monomeric diluents constituting at least 50% by weight of the composition;
• (a) one or more photoacid generators, (b) one or more photoinitiators, or (c) a mixture of one or more photoacid generators and said one or more photoinitiators;
• and
• wherein at least one monomer of said one or more monomers has the structure:
• and wherein R1 is an ethyl group and R2 is

A composition of matter, comprising:

• one or more monomers, each monomer consisting of a polyhedral silsesquioxane oligomer, each polyhedral silsesquioxane oligomer having one or more polymerizable groups, wherein each of said one or more polymerizable group is bound to a different silicon atom of a respective polyhedral silsesquioxane oligomer;
• one or more polymerizable monomeric diluents, said monomeric diluents constituting at least 50% by weight of the composition;
• (a) one or more photoacid generators, (b) one or more photoinitiators, or (c) a mixture of one or more photoacid generators and said one or more photoinitiators;
• and
• wherein at least one monomer of said one or more monomers has the structure:
• and wherein R3 is an isobutyl group and R4 is

A composition of matter, comprising:

• one or more monomers, each monomer consisting of a polyhedral silsesquioxane oligomer, each polyhedral silsesquioxane oligomer having one or more polymerizable groups, wherein each of said one or more polymerizable group is bound to a different silicon atom of a respective polyhedral silsesquioxane oligomer;
• one or more polymerizable monomeric diluents, said monomeric diluents constituting at least 50% by weight of the composition;
• (a) one or more photoacid generators, (b) one or more photoinitiators, or (c) a mixture of one or more photoacid generators and said one or more photoinitiators;
• and
• wherein said photoactive mixture includes about 50% by weight of polymerizable diluents, said polymerizable diluents having a viscosity of about 30 centipoise or less at about 20° C.