Method for producing semiconductor device
AssigneeEmpire Technology Development LLC
InventorTakahisa Kusuura
Life of this patent
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Abstract
A method for producing a semiconductor device includes forming an aluminum layer on a core substrate, anodizing the aluminum layer into an alumina layer having a plurality of nanoholes, forming an n-type GaN layer by growing crystals of a compound semiconductor such as an n-type GaN on the alumina layer and inside the nanoholes, and dissolving the alumina layer with an acid. As a result, gaps are formed and a structure in which the core substrate is joined to the n-type GaN layer through portions, other than the gaps, having a very small area is generated. Then a laser beam is applied to the n-type GaN layer through the core substrate to separate the n-type GaN layer from the core substrate by a laser lift-off technique.
Claims19
A method for producing a semiconductor device, comprising:
- preparing a first supporting member composed of sapphire;
- forming an aluminum layer on the first supporting member;
- forming an alumina layer with a plurality of penetrating holes by anodization of the aluminum layer;
- forming a first compound semiconductor layer by growing crystals of a group III-V compound semiconductor, group II-VI compound semiconductor, or oxide semiconductor of one of an n-type and a p-type on the alumina layer and inside the penetrating holes by chemical vapor deposition or physical vapor deposition;
- forming an active layer or a quantum well layer by growing crystals of a p- or n-type group III-V compound semiconductor, a p- or n-type group II-VI compound semiconductor, or a p- or n-type oxide semiconductor on the first compound semiconductor layer by chemical vapor deposition or physical vapor deposition;
- forming a second compound semiconductor layer by growing crystals of a group III-V compound semiconductor, group II-VI compound semiconductor, or oxide semiconductor of the other one of the n-type and p-type on the active layer or the quantum well layer by chemical vapor deposition or physical vapor deposition;
- removing the alumina layer by dissolving it in a phosphoric acid solution;
- separating the first compound semiconductor layer from the first supporting member by a laser lift-off technique involving irradiating a laser beam to the first compound semiconductor layer through the first supporting member or by mechanical shearing involving applying force to the first supporting member and the first compound semiconductor layer;
- connecting a first electrode to the first compound semiconductor layer;
- and
- connecting a second electrode to the second compound semiconductor layer.
A method for producing a semiconductor device, comprising:
- preparing a first supporting member;
- forming an alumina layer with a plurality of penetrating holes on the first supporting member;
- forming a first compound semiconductor layer on the alumina layer and inside the penetrating holes;
- removing the alumina layer;
- and
- separating the first compound semiconductor layer from the first supporting member.
A semiconductor device produced by preparing a first supporting member;
- forming an alumina layer with a plurality of penetrating holes on the first supporting member;
- forming a first compound semiconductor layer on the alumina layer and inside the penetrating holes;
- removing the alumina layer;
- and
- separating the first compound semiconductor layer from the first supporting member.
Dependencies are inferred from the claim text.