Developing apparatus and developing method

A developing method comprising:

• holding a substrate in a horizontal attitude on a substrate holding unit, the substrate having an exposed resist thereon;
• moving a developer nozzle having an ejection port having a shape of an elongated slit whose length measured in a longitudinal direction thereof is smaller than a radius of the substrate, while a moving direction of the developer nozzle being oriented parallel to the longitudinal direction of the ejection port, and while ejecting a developing solution in a form of a strip from the ejection port, thereby spirally supplying the developing solution onto a surface of the substrate while allowing the developing solution to flow radially outwardly;
• and
• stopping supplying the developing solution through the developer nozzle and supplying a rinse liquid to the surface of the substrate through a rinse liquid nozzle.