Radiation-sensitive resin composition

A radiation-sensitive resin composition comprising a resin and a solvent, the resin including a repeating unit shown by the following general formula (1),

• wherein R1 represents a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 3 carbon atoms, provided that some or all of the hydrogen atoms of the alkyl group may be replaced by a fluorine atom, M+ represents a sulfonium cation shown by the following general formula (2) or an iodonium cation shown by the following general formula (3), and n represents an integer from 1 to 5,
• wherein R2, R3, and R4 individually represent a substituted or unsubstituted linear or branched alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or an unsubstituted monovalent heterocyclic organic group having 4 to 30 atoms, or a substituent having a ring wherein two or more of R2, R3, and R4 are bonded via the sulfur atom,
• wherein R5 and R6 individually represent a substituted or unsubstituted linear or branched alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or an unsubstituted monovalent heterocyclic organic group having 4 to 30 atoms, or a substituent having a ring wherein R5 and R6 are bonded via the iodine atom.