Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method

A heat curable metal oxide-containing film-forming composition comprising

• (A) a metal oxide-containing compound obtained through hydrolytic condensation between one or multiple hydrolyzable silicon compounds having the general formula (1) and one or multiple hydrolyzable metal compounds having the general formula (2):
• R1m1R2m2R3m3Si(OR)(4-m1-m2-m3) (1)
• wherein R is an alkyl of 1 to 6 carbon atoms, R1, R2 and R3 each are hydrogen or a monovalent organic group of 1 to 30 carbon atoms, m1, m2 and m3 each are 0 or 1, and m1+m2+m3 is an integer of 0 to 3,
• U(OR4)m4(OR5)m5 (2)
• wherein U is an element selected from the group consisting of boron, gallium, germanium, bismuth, phosphorus, vanadium, arsenic, niobium, and tantlum, R4 and R5 each are an organic group of 1 to 30 carbon atoms, m4 and m5 each are an integer inclusive of 0, and m4+m5 is equal to the valence of U,
• (B) at least one compound having the general formula (3) or (4):
• LaHbX (3)
• wherein L is lithium, sodium, potassium, rubidium or cesium, X is a hydroxyl group or a mono or polyfunctional organic acid residue of 1 to 30 carbon atoms, “a” is an integer of at least 1, “b” is 0 or an integer of at least 1, and a+b is equal to the valence of hydroxyl group or organic acid residue,
• MaHbA (4)
• wherein M is sulfonium, iodonium or ammonium, A is X or a non-nucleophilic counter ion, “a” and “b” are as defined above, and a+b is equal to the valence of hydroxyl group, organic acid residue or non-nucleophilic counter ion,
• (C) a mono or polyfunctional organic acid of 1 to 30 carbon atoms, and
• (D) an organic solvent.