Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same

A method of forming a copolymer, comprising:

• hydrolyzing and/or condensing a first monomer, a second monomer, a third monomer, and a fourth monomer to form a siloxane, wherein:
• each of the first, second, third and fourth monomers contains silicon,
• the first monomer includes a silylhydride group,
• the second monomer includes one or more of:
• a disilane group, or
• a group having two silicon atoms bridged by a saturated hydrocarbon bridge,
• the third monomer includes a chromophore,
• the fourth monomer includes one or more of:
• a methyl group, or
• a hydrophilic group,
• the fourth monomer includes at least the hydrophilic group, the hydrophilic group forming part of the siloxane, and
• the hydrophilic group includes one or more of an aliphatic alcohol, a cycloaliphatic alcohol, an ether, or an ester.

A method of forming a copolymer, comprising:

• hydrolyzing and/or condensing a first monomer, a second monomer, a third monomer, and a fourth monomer to form a siloxane, wherein:
• each of the first, second, third and fourth monomers contains silicon,
• the first monomer includes a silylhydride group,
• the second monomer includes one or more of:
• a disilane group, or
• a group having two silicon atoms bridged by a saturated hydrocarbon bridge,
• the third monomer includes a chromophore,
• the fourth monomer includes one or more of:
• a methyl group, or
• a hydrophilic group,
• the first, third, and fourth monomers are chlorosilane monomers,
• the second monomer is an alkoxysilane monomer or a chlorosilane monomer, the fourth monomer includes at least the hydrophilic group, the hydrophilic group forming part of the siloxane, and the hydrophilic group includes one or more of an aliphatic alcohol, a cycloaliphatic alcohol, an ether, or an ester.

A method of forming a device, comprising:

• coating a composition on a substrate to form a first material layer;
• forming a photoresist layer on the first material layer;
• patterning the photoresist layer to expose a portion of the first material layer;
• removing the exposed portion of the first material layer to expose a portion of the substrate;
• and
• etching the exposed portion of the substrate, wherein:
• the composition includes a mixture of monomeric units having structures (A), (B), and (C), and one or more of structures (D) or (E):
• HSiO(3-a)/2(OH)a (A)
• SiO(3-b)/2(OH)b—(CH2)n—SiO(3-c)/2(OH)c (B)
• R1SiO(3-d)/2(OH)d (C)
• MeSi(3-e)/2(OH)e (D)
• R2SiO(3-f)/2(OH)f (E)
• wherein:
• a, b, c, d, e, and f are independently from 0 to 2,
• n is from 0 to about 10,
• R1 is a chromophore,
• R2 is a hydrophilic group,
• the monomeric unit having the structure (E) is present in the mixture, and
• R2 includes one or more of an aliphatic alcohol, a cycloaliphatic alcohol, an ether, or an ester.

A composition, comprising:

• a copolymer including a mixture of monomeric units having structures (A), (B), and (C), and one or more of structures (D) or (E):
• HSiO(3-a)/2(OH)a (A)
• SiO(3-b)/2(OH)b—(CH2)n—SiO(3-c)/2(OH)c (B)
• R1SiO(3-d)/2(OH)d (C)
• MeSiO(3-e)/2(OH)e (D)
• R2SiO(3-f)/2(OH)f (E)
• wherein:
• a, b, c, d, e, and f are independently from 0 to 2,
• n is from 0 to about 10,
• R1 is a chromophore,
• R2 is a hydrophilic group,
• and the copolymer includes monomeric units having the structures (A), (B), (C), (D), and (E).

A method of forming a copolymer, comprising:

• hydrolyzing and/or condensing a first monomer, a second monomer, a third monomer, and a fourth monomer to form a siloxane, wherein:
• each of the first, second, third and fourth monomers contains silicon,
• the first monomer includes a silylhydride group,
• the second monomer includes one or more of:
• a disilane group, or
• a group having two silicon atoms bridged by a saturated hydrocarbon bridge,
• the third monomer includes a chromophore,
• the fourth monomer includes one or more of:
• a methyl group, or
• a hydrophilic group,
• the fourth monomer includes the methyl group, and
• the mixture further includes a fifth monomer having a hydrophilic group.