Curable composition for nanoimprint, and patterning method
AssigneeFUJIFILM Corporation
InventorsKunihiko Kodama, Akinori Fujita, Tadashi Oomatsu, Akiyoshi Goto
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Abstract
A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.
Claims41
A curable composition for nanoimprints,
- comprising a polycyclic aromatic structure-having polymerizable monomer (Ax) and a photopolymerization initiator (B), wherein the polymerizable monomer contains a radical-polymerizable functional group selected from a (meth)acrylate group or an allyl group;
- or contains a cationic-polymerizable functional group selected from an epoxy group or an oxetane group.
A curable composition for nanoimprints, comprising a polycyclic aromatic structure-having polymerizable monomer (Ax) and a photopolymerization initiator (B), wherein the polymerizable monomer (Ax) is a compound represented by the following formula (I):
- wherein R1 represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, or a halogen atom;
- X represents —O—, —C(═O)O—, —C(═O)NRx- in which Rx represents a hydrogen atom or an organic group, an alkylene group, or a linking group of two or more such groups as combined;
- L represents an m-valent polycyclic aromatic group optionally having an alkyl group, an aryl group, a halogen atom, an acyloxy group, an alkoxycarbonyl group, a nitro group, a cyano group or an alkoxy group;
- and m indicates an integer from 1 to 3.
A curable composition for nanoimprints, comprising a polycyclic aromatic structure-having polymerizable monomer (Ax) and a photopolymerization initiator (B), wherein the polymerizable monomer contains a cationic-polymerizable functional group selected from an epoxy group or an oxetane group;
- or a radical-polymerizable functional group selected from a vinyl group, (meth)acrylate group or an allyl group, and wherein the polycyclic aromatic structure is selected from anthracene, phenanthrene, pyrene, indole, quinoline or benzisoquinoline.
Dependencies are inferred from the claim text.