Die imprint by double side force-balanced press for step-and-repeat imprint lithography

A method of imprint lithography to provide step-and-repeat imprint replication on a moldable surface of a substrate of a pattern having microscale or nanoscale features comprising the steps of:

• a). providing the substrate having the moldable surface;
• b). providing the mold having a molding surface that is for molding the pattern, the molding surface smaller in lateral area than said substrate;
• c). providing a body facing said molding surface of said mold;
• d). disposing said substrate in a laterally movable positioner between said mold and said body wherein said moldable surface faces said molding surface;
• e). pressing both sides of said substrate at opposing locations with said mold and said body by opposing transverse forces that are balanced;
• f). at least partially hardening the moldable surface;
• g). removing said mold and said body from said substrate;
• h). laterally moving said movable positioner and said substrate relative to said mold and said body;
• and
• i). repeating step e to step g at least once.