Imprint system and imprint method

An imprint system, comprising:

• a first design data storing section which stores template information including a position and a depth of a concave-convex pattern of a template;
• a vaporization-to-be-compensated storing section which stores a plurality of distributions of applied amounts for compensating vaporization, each showing an applied position and an applied amount of an imprint member that compensates the imprint member to vaporize, in accordance with pattern densities of said template;
• a first arithmetic section which
• calculates a pattern density of the template from said template information,
• extracts a distribution of an applied amount for compensating vaporization, corresponding to this pattern density, from said vaporization-to-be-compensated storing section,
• calculates a dummy template pattern such that this extracted distribution of an applied amount for compensating vaporization becomes a distribution of an applied amount for filling a pattern, showing an applied position and an applied amount of the imprint member corresponding to the imprint member to fill the concave-convex pattern, and
• synthesizes this dummy template pattern with the concave-convex pattern of said template, to create a synthesized pattern;
• a second design data storing section which stores synthesized pattern information including said synthesized pattern, and remaining film thickness set value information including a film thickness of a remaining film uniformly formed on a substrate;
• a second arithmetic section which
• calculates a distribution of an applied amount for filling the synthesized pattern, showing an applied position and an applied amount of the imprint member corresponding to the imprint member to fill the inside of a concave-convex pattern of said synthesized pattern based upon said synthesized pattern information,
• calculates a distribution of an applied amount for forming a remaining film thickness, showing an applied position and an applied amount of the imprint member corresponding to the imprint member to form the remaining film based upon said remaining film thickness set value information, and
• adds up said distribution of an applied amount for filling a synthesized pattern and said distribution of an applied amount for forming a remaining film thickness, to calculate a distribution of an applied amount of the imprint member;
• and
• an application section which applies the imprint member on the substrate based upon said distribution of an applied amount of the imprint member.