Pattern image correcting apparatus, pattern inspection apparatus, and pattern image correcting method

A pattern image correcting apparatus for correcting an inspection reference pattern image in a pattern inspection, comprising:

• a first pattern synthesizing unit for synthesizing an assist pattern image and a pattern image to be inspected, thereby generating a pattern image to be inspected with an assist pattern;
• an assist pattern shift processing unit for shifting the assist pattern image on the basis of an amount of a relative positional deviation between the inspection reference pattern image and the pattern image to be inspected;
• a second pattern synthesizing unit for synthesizing the shifted assist pattern image and the inspection reference pattern image, thereby generating an inspection reference pattern image with an assist pattern;
• a model generating unit for generating a position shift model by using the pattern image to be inspected with the assist pattern and the inspection reference pattern image with the assist pattern;
• and
• a correction pattern image computing unit for correcting the inspection reference pattern image on the basis of the position shift model.