Method for simultaneous electronic lapping guide (ELG) and perpendicular magnetic recording (PMR) pole formation
AssigneeWestern Digital (Fremont), LLC
InventorsJinqiu Zhang, Tsung Yuan Chen, Steven C. Rudy
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Abstract
A method for providing a perpendicular magnetic recording (PMR) head is disclosed. The method comprises: providing a stop layer; providing an insulating layer over the stop layer; forming a pole trench in the insulating layer by performing a reactive ion etching (RIE) process in the insulating layer over the stop layer; forming an electronic lapping guide (ELG) in the insulating layer by performing the RIE process in the insulating layer over the stop layer; and providing a PMR pole in which at least a portion of the PMR pole resides in the pole trench.
Claims20
A method for providing a perpendicular magnetic recording (PMR) head comprising:
- providing a stop layer;
- providing an insulating layer over the stop layer;
- forming a pole trench in the insulating layer by performing a reactive ion etching (RIE) process in the insulating layer over the stop layer;
- forming an electronic lapping guide (ELG) in the insulating layer by performing the RIE process in the insulating layer over the stop layer;
- and
- providing a PMR pole, at least a portion of the PMR pole residing in the pole trench.
A method for providing a perpendicular magnetic recording (PMR) head comprising:
- providing a stop layer including at least one of Cr, NiCr, and Ru;
- providing an insulating layer over the stop layer including at least alumina;
- forming a pole trench in the insulating layer by performing a reactive ion etching (RIE) process in the insulating layer over the stop layer;
- forming an electronic lapping guide (ELG) in the insulating layer by performing the RIE process in the insulating layer over the stop layer, wherein the pole trench and the ELG are formed simultaneously;
- and
- providing a PMR pole, at least a portion of the PMR pole residing in the pole trench.
A perpendicular magnetic recording (PMR) head comprising:
- a stop layer;
- an insulating layer formed over the stop layer;
- a pole trench formed in the insulating layer by performing a reactive ion etching (RIE) process in the insulating layer over the stop layer;
- an electronic lapping guide (ELG) formed in the insulating layer by performing the RIE process in the insulating layer over the stop layer, wherein the pole trench and the ELG are formed simultaneously;
- and
- a PMR pole, at least a portion of the PMR pole residing in the pole trench.
Dependencies are inferred from the claim text.