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US 8,016,924 B2Granted
Device for gas separation and method for producing such a system
AssigneeForschungszentrum Juelich GmbH
InventorsWilhelm A. Meulenberg, Ralf Hansch, Hans Peter Buchkremer, Detlev Stöver
Life of this patent
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Abstract
A system for gas separation has a mechanically stable metallic substrate layer having a pair of opposite faces and formed throughout with open pores. Respective functional layers laminated on each of the faces are composed of TiO2 or ZrO2. These functional layers are formed throughout with pores having an average pore diameter of less than 1 nm.
Claims10
A system for gas separation, the system comprising:
- a mechanically stable metal substrate layer having a pair of faces and formed throughout with open pores, and
- a functional layer laminated to one of the faces, composed of TiO2 or ZrO2, formed throughout with pores, and having an average pore diameter of less than 1 nm.
A system for gas separation, the system comprising:
- a mechanically stable metal substrate layer having a pair of opposite faces and formed throughout with open pores;
- and
- respective functional layers on each of the faces and composed of TiO2 or ZrO2, the functional layers being formed throughout with pores having an average pore diameter of less than 1 nm.
A system for gas separation, the system comprising:
- a mechanically stable metal substrate layer having a pair of opposite faces and formed throughout with open pores;
- and
- a functional layer on at least one of the faces, composed of TiO2 or ZrO2, and formed throughout with pores having an average pore diameter of less than 1 nm and varying continuously or graduatedly.
Dependencies are inferred from the claim text.