Cathode planes for field emission devices
AssigneeTatung Co., Ltd.
InventorsChi-Tsung Lo, Tzung-Han Yang, Richard Allan Tuck
Life of this patent
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Abstract
A substrate 200 is provided with conductive cathode tracks and a field electron emission material on the tracks. Septa 201 and pillars 202 are provided as raised elements over the emission material. An electrically insulating layer is formed over the emission material and raised elements 201, 202, such that boundary walls are formed in the insulating layer where it contacts the raised elements. The raised elements 201, 202 are then removed, to leave emitter cells and voids for other components, defined by the boundary walls with the insulating layer. A gate electrode is provided over the insulating layer.
Claims24
A method of creating a cathode plane for a field emission device, the method comprising the steps of:
- a. providing a substrate, at least one electrically conductive electrode on the substrate and a field electron emission material on each said electrode;
- b. providing over said emission material a plurality of raised elements;
- c. forming an electrically insulating layer over said emission material and raised elements, such that boundary walls are formed in said insulating layer where it contacts said raised elements;
- d. removing said raised elements to leave emitter cells defined by said boundary walls, and wherein a protective aluminum layer is provided over said emission material to protect it from subsequent steps of the method.
A method of creating a cathode plane for a field emission device, the method comprising the steps of:
- a. providing a substrate, at least one electrically conductive electrode on the substrate and a field electron emission material on each said electrode;
- b. providing over said emission material a plurality of raised elements;
- c. forming an electrically insulating layer over said emission material and raised elements, such that boundary walls are formed in said insulating layer where it contacts said raised elements;
- d. removing said raised elements to leave emitter cells defined by said boundary walls, and wherein a protective layer is provided over said emission material to protect it from subsequent steps of the method and wherein at least part of said protective layer is removed by an etching process to expose at least part of said emission material after removing said raised elements to leave emitter cells defined by said boundary walls.
Dependencies are inferred from the claim text.