Pattern test method of testing, in only specific region, defect of pattern on sample formed by charged beam lithography apparatus

A computer-implemented pattern test method in which a drawing region is divided into a plurality of deflection regions determined by a deflection width of a deflector of a charged beam lithography apparatus, the charged beam lithography apparatus draws a pattern in each divided deflection region on the basis of pattern design data to obtain a sample, and a defect of the pattern on the sample is tested, the pattern test method comprising:

• determining, by a computer, coordinates of a connecting portion of the deflection regions;
• dividing, by a computer, the pattern design data into boundary region pattern data as the connecting portion of the deflection regions, and pattern data except for the boundary region pattern data;
• obtaining, by a computer, image data of the pattern formed on the sample;
• and
• comparing, by a computer, the pattern data except for the boundary region pattern data with the image data to detect defect on the sample,
• wherein determining coordinates of a connecting portion of the deflection regions includes calculating vertex coordinates of each deflection region from a width of the deflection region and central coordinate information, and determining a test region of the deflection region on the basis of the vertex coordinates.

A computer-implemented pattern test method in which a drawing region is divided into a plurality of deflection regions determined by a deflection width of a deflector of a charged beam lithography apparatus, the charged beam lithography apparatus draws a pattern in each divided deflection region on the basis of pattern design data to obtain a sample, and a defect of the pattern on the sample is tested, the pattern test method comprising:

• determining, by a computer, coordinates of a connecting portion of the deflection regions;
• dividing, by a commuter, the pattern design data into boundary region pattern data as the connecting portion of the deflection regions, and pattern data except for the boundary region pattern data;
• obtaining, by a computer, image data of the pattern formed on the sample;
• selecting, by a computer, one of the boundary region pattern data and the pattern data except for the boundary region pattern data as a region to be tested;
• and
• comparing, by a computer, the pattern data in the selected region with the image data to detect defect on the sample,
• wherein determining coordinates of a connecting portion of the deflection regions includes calculating vertex coordinates of each deflection region from a width of the deflection region and central coordinate information, and determining a test region of the deflection region on the basis of the vertex coordinates.