Illumination system with low telecentricity error and dynamic telecentricity correction

A lithography system, comprising:

• a source of radiation configured to emit a beam of radiation;
• an illuminator configured to process the beam of radiation, the illuminator comprising,
• a plurality of mirrors configured to split the beam of radiation into a plurality of beam segments;
• a plurality of first movable optical elements configured to correct telecentricity for the plurality of beam segments;
• a plurality of second movable optical elements configured to correct telecentricity for the plurality of beam segments, wherein the plurality of second movable optical elements is configured to direct the corrected plurality of beam segments to a patterning device;
• the patterning device configured to pattern the processed beam segments ;
• and
• a projection system configured to project the patterned beam segments onto a target portion of a substrate.

A beam control system for lithographic processing, the beam control system comprising:

• a plurality of optical elements disposed in an optical path of a light beam configured to split the light beam into a plurality of beam segments;
• a plurality of first optical elements and a plurality of second optical elements configured to correct telecentricity for the plurality of beam segments prior to the beam segments being directed to a patterning device;
• and
• one or more sets of one or more corresponding actuators coupled to the plurality of first and second optical elements, wherein the one or more corresponding actuators is configured to reposition respective ones of the plurality of first and second optical elements in response to one or more corresponding actuation signals,
• wherein the one or more corresponding actuators arc used to adjust positions of the plurality of first and second optical elements to maintain low telecentricity error.