Lithographic apparatus, radiation sensor and method of manufacturing a radiation sensor
AssigneeASML Netherlands B.V.
InventorsHaico Victor Kok, Arie Johan Van Der Sijs
Life of this patent
Estimating the term…
Abstract
A radiation sensor includes a radiation receiver positioned in a focal plane of the final element of the projection system; a transmissive plate supporting the radiation receiver at a side facing the projection system; a quantum conversion layer to absorb light at the first wavelength incident on the transmissive plate and reradiate light at a second wavelength; a fiber optics block with a plurality of optical fibers; and a radiation detector. In the radiation sensor, the plurality of optical fibers guide light is reradiated by the quantum conversion layer towards the radiation detector. The radiation sensor can be used as a substrate-level sensor in a lithographic apparatus.
Claims25
A lithographic apparatus, comprising:
- a support configured to support a patterning device, the patterning device being configured to provide a radiation beam at a first wavelength with a pattern in the cross-section of the radiation beam to form a patterned radiation beam at the first wavelength;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising a final element;
- and
- a substrate-level sensor comprising
- a radiation receiver positioned in, or positionable into, a focal plane of the final element;
- a transmissive plate configured to support the radiation receiver at a side facing the projection system;
- a quantum conversion layer configured to absorb radiation at a first wavelength incident on the transmissive plate and reradiate radiation at a second wavelength, the quantum conversion layer arranged on a side of the transmissive plate opposite the side facing the projection system;
- a fiber optics block comprising a plurality of optical fibers;
- and
- a radiation detector, wherein the plurality of optical fibers is configured to guide radiation reradiated by the quantum conversion layer towards the radiation detector,
- wherein the fiber optics block is connected to the quantum conversion layer and separable from the radiation detector so as to be spaced away from the radiation detector.
A device manufacturing method, comprising:
- projecting a pattern from a patterning device onto a substrate using a projection system;
- and
- measuring lens aberrations of the projection system using a substrate-level sensor comprising
- a radiation receiver positioned in a focal plane of a final element of the projection system;
- a transmissive plate configured to support the radiation receiver at a side facing the projection system;
- a quantum conversion layer configured to absorb radiation at a first wavelength incident on the transmissive plate and reradiate radiation at a second wavelength, the quantum conversion layer arranged on a side of the transmissive plate opposite the side facing the projection system;
- a fiber optics block comprising a plurality of optical fibers;
- and
- a radiation detector, wherein the plurality of optical fibers is configured to guide radiation reradiated by the quantum conversion layer towards the radiation detector,
- wherein the fiber optics block is connected to the quantum conversion layer and separable from the radiation detector so as to be spaced away from the radiation detector.
A radiation sensor, comprising:
- a radiation receiver configured to receive incident radiation;
- a transmissive plate configured to support the radiation receiver at a first side;
- a quantum conversion layer configured to absorb radiation at a first wavelength incident on the transmissive plate and reradiate radiation at a second wavelength, the quantum conversion layer arranged on a side of the transmissive plate opposite the side facing the projection system;
- a fiber optics block comprising a plurality of optical fibers configured to collect and guide radiation reradiated by the quantum conversion layer;
- and
- a radiation detector configured to receive radiation guided by the plurality of optical fibers,
- wherein the fiber optics block is connected to the quantum conversion layer and separable from the radiation detector so as to be spaced away from the radiation detector.
A lithographic apparatus, comprising:
- a support configured to support a patterning device, the patterning device configured to provide a radiation beam at a first wavelength with a pattern in the cross-section of the radiation beam to form a patterned radiation beam;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
- and
- a radiation sensor comprising
- a radiation receiver configured to receive incident radiation;
- a transmissive plate configured to support the radiation receiver at a first side;
- a quantum conversion layer configured to absorb radiation at a first wavelength incident on the transmissive plate and reradiate radiation at a second wavelength;
- a fiber optics block comprising a plurality of optical fibers configured to collect and guide radiation reradiated by the quantum conversion layer;
- and
- a radiation detector configured to receive radiation guided by the plurality of optical fibers,
- wherein the fiber optics block includes an absorbing material separate from, and arranged between, the fibers, the absorbing material configured to substantially absorb the reradiated radiation that falls outside a numerical aperture of the fiber optics block.
A device manufacturing method, comprising:
- providing a radiation beam using an illumination system;
- patterning the radiation beam;
- projecting the patterned beam onto a target portion of a substrate;
- and
- measuring properties of the illumination system using a radiation sensor comprising
- a radiation receiver configured to receive incident radiation;
- a transmissive plate configured to support the radiation receiver at a first side;
- a quantum conversion layer configured to absorb radiation at a first wavelength incident on the transmissive plate and reradiate radiation at a second wavelength;
- a fiber optics block comprising a plurality of optical fibers configured to collect and guide radiation reradiated by the quantum conversion layer;
- and
- a radiation detector configured to receive radiation guided by the plurality of optical fibers,
- wherein the fiber optics block includes an absorbing material separate from, and arranged between, the fibers, the absorbing material configured to substantially absorb the reradiated radiation that falls outside a numerical aperture of the fiber optics block.
A method of manufacturing a radiation sensor, the method comprising:
- forming a structure by connecting a fiber optics block comprising a plurality of optical fibers with a block of quantum conversion material, the structure having a first end arranged for connection with the plurality of optical fibers and a second end arranged for connection with the quantum conversion material;
- reducing the volume of the structure at the second end to form a fiber optics block provided with a quantum conversion layer;
- connecting a transmissive plate with the second end of the structure;
- positioning a radiation detector adjacent the first end of the structure,
- wherein the fiber optics block includes an absorbing material separate from, and arranged between, the fibers, the absorbing material configured to substantially absorb the reradiated radiation that falls outside a numerical aperture of the fiber optics block.
Dependencies are inferred from the claim text.