Exposure apparatus, exposure method, and device fabrication method

A method using an apparatus comprises a projection optical system configured to project a pattern of a reticle onto a substrate, a measurement substrate which is inserted on an image plane of the projection optical system and includes a transmission part configured to transmit a light beam having passed through the projection optical system, and a light-receiving unit including a light-receiving surface configured to receive the light beam transmitted through a liquid and the transmission part, comprising:

• arithmetically converting a light intensity distribution, on the light-receiving surface, of the light beam received by the light-receiving surface into a light intensity distribution on a pupil plane of the projection optical system, based on information indicating a correlation between a position coordinate on the light-receiving surface and a position coordinate on the pupil of the projection optical system;
• and
• adjusting an optical characteristic of the apparatus based on a conversion result obtained in the converting step, and
• wherein the converting step divides a region of the pupil plane of said projection optical system into a plurality of elements arrayed in a grid pattern, and
• the converting step calculates a light intensity of one element of the plurality of elements by multiplying a light amount in at least one pixel on said light-receiving surface by a ratio of an area of the region on said light-receiving surface where light having passed through the one element reaches said pixel on said light-receiving surface and a total area of said pixel.