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US 8,013,077 B2Granted
Insulating film forming composition and production method of insulating film
AssigneeFUJIFILM Corporation
InventorKensuke Morita
Life of this patent
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Abstract
An insulating film forming composition, includes: a polymer compound obtained by polymerizing a cage-type silsesquioxane compound having two or more unsaturated groups as substituents; a heat-resistant organic polymer compound having a carbon-carbon unsaturated bond; and an organic solvent, and a method for producing an insulating film, includes: coating the insulating film forming composition on a substrate; and then curing the coating.
Claims7
An insulating film forming composition, comprising:
- a polymer compound obtained by polymerizing a cage-type silsesquioxane compound having two or more vinyl groups or ethynyl groups as substituents;
- a heat-resistant organic polymer compound having a carbon-carbon unsaturated bond;
- and
- an organic solvent
- wherein in the polymer compound, the vinyl groups or ethynyl groups of the cage-type silsesquioxane compound remain unreacted at a rate of 10 to 99 mol %.
2 more elements
Dependencies are inferred from the claim text.