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US 8,012,922 B2Granted
Wet cleaning solution
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsCheng-Yuan Tsai, Chih-Lung Lin, Cheng-Chen Hsueh
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Abstract
A wet cleaning solution, comprising 0.01-3 wt % of an amphoteric imidazolium surfactant capable of forming a complex with metal ions, a pH adjuster, and balanced deionized water. The wet cleaning solution is substantially free of corrosion inhibitor other than the imidazolium amphoteric surfactant.
Claims9
A hydrophobic semiconductor substrate cleaning solution, consisting of:
- an imidazolium amphoteric surfactant capable of forming a complex with metal ions;
- a pH adjuster;
- and
- balance deionized water.
1 more element
Dependencies are inferred from the claim text.