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US 8,012,883 B2Granted
Stripping method
AssigneeRohm and Haas Electronic Materials LLC
InventorsLuis A. Gomez, Jason A. Reese
Life of this patent
Estimating the term…
Abstract
Methods are provided for manufacturing optical display devices which remove an etch resist and residual post-etch metal in a single step. These methods are particularly useful in the manufacture of LCDs.
Claims15
A method of etching a metal layer comprising:
- providing a substrate having a metal layer disposed thereon;
- disposing an etching resist on the metal layer;
- patterning the etching resist to expose areas of metal;
- contacting the exposed areas of metal with a wet etching composition to remove a portion of the exposed metal;
- and contacting the substrate with a stripping composition to remove the etching resist and the remaining exposed metal;
- wherein the substrate is an optically transparent substrate and wherein the stripping composition comprises 5 to 65 wt % of a polyhydric alcohol, 5 to 55 wt % water, 5 to 65 wt % of a water-miscible amine and 5 to 50 wt % of a polar solvent, wherein the water-miscible amine is chosen from alkyleneamines and aminoalcohols, and wherein the polar solvent is chosen from polar aprotic solvents, dimethylformamide, dimethylacetamide, γ-butyrolactone and glycol ethers.
3 more elements
A method of manufacturing a display device comprising:
- providing a substrate having a metal layer disposed thereon;
- disposing an etching resist on the metal layer;
- patterning the etching resist to expose areas of metal;
- contacting the exposed areas of metal with an etching composition to remove a portion of the exposed metal;
- and contacting the substrate with a stripping composition to remove the etching resist and the remaining exposed metal;
- wherein the substrate is an optically transparent substrate and wherein the stripping composition comprises 5 to 65 wt % of a polyhydric alcohol, 5 to 55 wt % water, 5 to 65 wt % of a water-miscible amine and 5 to 50 wt % of a polar solvent, wherein the water-miscible amine is chosen from alkyleneamines and aminoalcohols, and wherein the polar solvent is chosen from polar aprotic solvents, dimethylformamide, dimethylacetamide, γ-butyrolactone and glycol ethers.
3 more elements
A method of etching a metal layer comprising:
- providing a substrate having a metal layer disposed thereon;
- disposing an etching resist on the metal layer;
- patterning the etching resist to expose areas of metal;
- contacting the exposed areas of metal with a wet etching composition to remove a portion of the exposed metal;
- and contacting the substrate with a stripping composition to remove the etching resist and the remaining exposed metal;
- wherein the substrate is an optically transparent substrate and wherein the stripping composition comprises from 5 to 65 wt % of a polyhydric alcohol chosen from 1,3-propanediol, 2-methyl-1,3-propanediol, butanediol and glycerol;
- from 5 to 40 wt % water;
- from 5 to 65 wt % of a water-miscible amine chosen from amino ethylaminoethanol, ethanolamine, diethanolamine, triethanolamine, monoisopropanol amine, diisopropanolamine, ethyl enediamine, diethylenetriamine and triethylenetetraamine;
- from 5 to 50 wt % of a polar solvent chosen from dimethyl sulfoxide, sulfolane, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, propylene glycol dimethyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol dimethyl ether, and dipropylene glycol mono-n-butyl ether;
- and from 0.2 to 5 wt % of a corrosion inhibitor.
7 more elements
Dependencies are inferred from the claim text.