A method of manufacturing a plurality of layered chip packages, each of the layered chip packages comprising a main body having a top surface, a bottom surface, and four side surfaces, the main body including a plurality of layer portions stacked, the plurality of layer portions having their respective semiconductor chips, each of the semiconductor chips having a first surface with a device formed thereon and a second surface opposite to the first surface, the plurality of layer portions including at least two pairs of layer portions, each pair of layer portions being arranged so that the first surfaces of the respective semiconductor chips face each other,
- the method comprising the steps of:
- fabricating a layered substructure that includes at least one set of first to fourth substructures stacked;
- and
- producing the plurality of layered chip packages by using the layered substructure, wherein:
- each of the first to fourth substructures includes an array of a plurality of preliminary layer portions, each of the preliminary layer portions being intended to become any one of the plurality of layer portions, the first to fourth substructures being intended to be cut later at a position of a boundary between every adjacent preliminary layer portions;
- and
- the step of fabricating the layered substructure includes the steps of:
- fabricating first to fourth pre-polishing substructures each by processing a first surface of a semiconductor wafer having the first surface and a second surface that face toward opposite directions, each of the first to fourth pre-polishing substructures including an array of a plurality of pre-semiconductor-chip portions that are intended to become individual semiconductor chips, each of the first to fourth pre-polishing substructures having first and second surfaces that correspond to the first and second surfaces of the semiconductor wafer;
- forming a first pre-polishing stack by bonding the first pre-polishing substructure and the second pre-polishing substructure to each other such that the first surface of the first pre-polishing substructure and the first surface of the second pre-polishing substructure face each other;
- polishing the second surface of the second pre-polishing substructure of the first pre-polishing stack so that the second pre-polishing substructure is thinned by the polishing into the second substructure to thereby form a first stack that includes the first pre-polishing substructure and the second substructure;
- forming a second pre-polishing stack by bonding the third pre-polishing substructure and the fourth pre-polishing substructure to each other such that the first surface of the third pre-polishing substructure and the first surface of the fourth pre-polishing substructure face each other;
- polishing the second surface of the third pre-polishing substructure of the second pre-polishing stack so that the third pre-polishing substructure is thinned by the polishing into the third substructure to thereby form a second stack that includes the third substructure and the fourth pre-polishing substructure;
- forming a third pre-polishing stack by bonding the first stack and the second stack to each other such that the second substructure and the third substructure face each other;
- polishing the second surface of the fourth pre-polishing substructure of the third pre-polishing stack so that the fourth pre-polishing substructure is thinned by the polishing into the fourth substructure and the third pre-polishing stack is thereby made into a third stack;
- and
- polishing the second surface of the first pre-polishing substructure of the third stack so that the first pre-polishing substructure is thinned by the polishing into the first substructure.