Resist composition and method of forming resist pattern

A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure,

• said acid-generator component (B) comprising an acid generator (B1) consisting of a compound represented by any one of general formulae (b1-2), (b1-1-1), (b1-1-2), (b1-1-3), (b1-1-4), (b1-1-5) and (b1-2-3) shown below, and
• said resist composition further comprising an organic compound (C) which generates an acid exhibiting a weaker acid strength than the acid generated from said acid generator (B1) upon exposure
• wherein RX represents an aliphatic group which may have a substituent exclusive of a nitrogen atom;
• R1 represents an alkylene group;
• Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent, with the proviso that the carbon atom adjacent to the sulfur atom within the —SO3− group has a fluorine atom bonded thereto;
• and A+ represents an organic cation;
• wherein Q″ represents an alkylene group of 1 to 5 carbon atoms, —O—, —S—, —O—R94— or —S—R95—, wherein each of R94 and R95 independently represents an alkylene group of 1 to 5 carbon atoms, provided that Q″ does not represent an alkylene group of 1 to 5 carbon atoms in formula (b1-1-1);
• A+ represents an organic cation;
• p represents an integer of 1 to 3;
• each of m1 to m5 independently represents 0 or 1;
• each of v1 to v5 independently represents an integer of 0 to 3;
• each of w1 to w5 independently represents an integer of 0 to 3;
• and R7 represents a substituent;
• and
• wherein A+ represents an organic cation;
• p represents an integer of 1 to 3;
• q3 represents an integer of 1 to 12;
• r2 represents an integer of 0 to 3;
• and R7′ represents a substituent.