Back to results
US 8,012,666 B2Granted
Compositions and processes for photolithography
AssigneeRohm and Haas Electronic Materials LLC
InventorsMichael K. Gallagher, Deyan Wang
Life of this patent
Estimating the term…
Abstract
Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
Claims12
A method for processing a photoresist composition, comprising:
- (a) applying on a substrate a photoresist composition;
- (b) applying above the photoresist composition an organic composition comprising one or more acid generator compounds and a resin component that comprises a copolymer resin that comprises one or more hydrophilic groups, and a resin that comprises photoacid-labile groups,
- wherein a resin of the composition above the photoresist layer comprises (i) photoacid-labile groups, and (ii) one or more ester, acetal, ether, hydroxyl or carboxy groups;
- (c) immersion exposing the photoresist layer to radiation activating for the photoresist composition.
1 more element
Dependencies are inferred from the claim text.