Method of forming a thin film pattern and method of fabricating a liquid crystal display device
AssigneeLG Display Co., Ltd.
InventorsJin Wuk Kim, Seong Pil Cho
Life of this patent
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Abstract
A method of forming a thin film pattern includes: providing a printing roller and a substrate including a thin film; coating the printing roller with an etch-resist solution including a base polymer, a carrier solvent, a tackifier and a surfactant; removing the carrier solvent from the coated etch-resist solution thereby transitioning the etch-resist solution from liquid phase to solid phase; patterning the solid etch-resist; transferring the patterned etch-resist from the printing roller to the substrate; and patterning the thin film corresponding to the transferred etch-resist.
Claims23
A method of fabricating a LCD device, comprising:
- preparing a thin film transistor substrate and a color filter substrate,
- wherein the preparing at least one of the thin film transistor substrate and the color filter substrate includes the steps of:
- providing a printing roller;
- coating the printing roller with an etch-resist solution including a base polymer, a carrier solvent, a tackifier and a surfactant;
- removing the carrier solvent from the coated etch-resist solution thereby transitioning the etch-resist solution from liquid phase to solid phase;
- patterning the solid etch-resist;
- transferring the patterned etch-resist from the printing roller to the substrate;
- and
- patterning a thin film of the substrate corresponding to the transferred etch-resist;
- and
- providing a liquid crystal layer between the thin film transistor substrate and color filter substrate;
- bonding the thin film transistor substrate and the color filter substrate;
- and
- wherein the tackifier is used polyhydroxystyrene (PHS) having a plurality of hydroxyl (OH−) groups and the PHS is combined with a hydroxyl group of the base polymer to form a hydrogen bond.
A method of forming a thin film pattern comprising:
- providing a printing roller and a substrate including a thin film;
- coating the printing roller with an etch-resist solution including a base polymer, a carrier solvent, a tackifier and a surfactant;
- removing the carrier solvent from the coated etch-resist solution thereby transitioning the etch-resist solution from liquid phase to solid phase;
- patterning the solid etch-resist;
- transferring the patterned etch-resist from the printing roller to the substrate;
- patterning the thin film corresponding to the transferred etch-resist;
- and
- wherein the tackifier is used polyhydroxystyrene (PHS) having a plurality of hydroxyl (OH−) groups and the PHS is combined with a hydroxyl group of the base polymer to form a hydrogen bond.
Dependencies are inferred from the claim text.