Controlling the vaporization of organic material

A method for controlling the deposition of vaporized organic material onto a substrate surface, comprising:

• a) providing a manifold to distribute fully vaporized organic material, the manifold having at least one aperture through which vaporized organic material passes for deposition onto the substrate surface;
• b) providing a volume of organic material and maintaining the temperature by actively cooling such organic material in a first condition so that its vapor pressure is below that needed to effectively vaporize and form a layer on the substrate, and in a second condition using a heating device for heating a volume percentage of the initial volume of such organic material so that the temperature of the heated organic material causes such material to vaporize and pass through the aperture in the manifold to form a layer on the substrate surface;
• c) providing a rotatable auger and metering by using such auger the organic material from the position where such organic material is in the first condition to the position where it is in the second condition to control the rate of vaporization;
• and
• d) separating the heating device from the organic material so that there is no organic material subject to the second condition.