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US 8,012,395 B2Granted
Template having alignment marks formed of contrast material
AssigneeMolecular Imprints, Inc.
InventorsKosta S. Selinidis, Byung-Jin Choi, Gerard M. Schmid, Ecron D. Thompson, Ian Matthew McMackin
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Abstract
Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.
Claims17
A method of patterning an imprint nano-lithography substrate, comprising:
- patterning a first portion of the substrate with a plurality of recessions and a plurality of protrusions;
- patterning a second portion of the substrate with at least one alignment mark, at least a portion of the alignment mark being formed of high contrast material, wherein the patterning of the second portion includes depositing high contrast material on the alignment mark and wherein the high contrast material is localized solely at a patterning surface of the alignment mark;
- and,
- wherein the first portion of the substrate and the second portion of the substrate are patterned within the same step.
1 more element
A method of patterning an imprint nano-lithography substrate, comprising:
- patterning a first portion of the substrate with a plurality of recessions and a plurality of protrusions;
- patterning a second portion of the substrate with at least one alignment mark, at least a portion of the alignment mark being formed of high contrast material, wherein the high contrast material is localized solely at a patterning surface of the alignment mark;
- patterning a sidewall on the substrate;
- and,
- wherein the first portion of the substrate and the second portion of the substrate are patterned within the same step.
2 more elements
Dependencies are inferred from the claim text.