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US 8,012,334 B2Granted
Metal plating compositions and methods
AssigneeRohm and Haas Electronic Materials LLC
InventorsErik Reddington, Gonzalo Urrutia Desmaison, Zukhra I. Niazimbetova, Donald E. Cleary, Mark Lefebvre
Life of this patent
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Abstract
Disclosed are metal plating compositions and methods. The metal plating compositions provide good leveling performance and throwing power.
Claims3
A composition comprising one or more sources of metal ions chosen from copper, tin, nickel, gold, silver, palladium, platinum, indium or alloys thereof, and one more compounds
- having a formula:
- H-A′p-Q-[C(O)—CH2O—((R1CH)t—O)z—CH2—C(O)—NH-A]u-H (I)
- where A′ is —(NH—(CH2)x′)y′—;
- —NH(CH2)x′—(O—(CHR1)r′)w′—O—(CH2)x′—;
- or —NH—((R1CH)r′—O)w′—C2H4—,
- A is —((CH2)x—NH)y—;
- —(CH2)x—(O—(CHR1)r)w—O—(CH2)x—NH—;
- or —((R1CH)r—O)w—C2H4—NH—,
- R1 is —H or —CH3,
- Q is —NH— when p=1 or —O— when p=0,
- p is 0 or 1, wherein H— and Q form a chemical bond when p=0,
- r′ is an integer from 2 to 4,
- w′ is an integer from 1 to 50,
- x′ is an integer from 2 to 6,
- y′ is an integer from 0 to 5,
- wherein H— and Q form a chemical bond when y′ is 0,
- r is an integer from 2 to 4,
- w is an integer from 1 to 50,
- x is an integer from 2 to 6,
- y is an integer from 0 to 5, wherein H— is bonded to the nitrogen of terminal —C(O)—NH— when y is 0,
- t is an integer from 2 to 4,
- u is an integer from 1 to 20,
- w is an integer from 1 to 50, and
- z is an integer from 1 to 50.
21 more elements
Dependencies are inferred from the claim text.