Container cleanliness measurement apparatus and method, and substrate processing system
AssigneeTokyo Eletctron Limited
InventorsTsuyoshi Moriya, Toshiya Matsuda
Life of this patent
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Abstract
A container cleanliness measurement apparatus capable of preventing particles from being adhered to substrates, while improving the operation efficiency of a container for housing substrates. An FOUP inspection apparatus includes a particle-separation promoting nozzle for promoting separation of particles adhered to an inner wall of an FOUP and to carries for holding peripheral portions of wafers inside the FOUP, a particle collecting nozzle for collecting particles separated from the inner wall of the FOUP, etc., and a particle counter for measuring an amount of collected particles. The particle-separation promoting nozzle and the particle collecting nozzle constitute a probe nozzle which is adapted to enter inside the FOUP.
Claims17
A container cleanliness measurement apparatus comprising:
- a separation promoting unit adapted to promote separation of particles;
- a collection unit adapted to collect separated particles
- a measurement unit adapted to measure an amount of collected particles;
- and
- a lid holder adapted to open and close a lid of a container which is adapted to house substrates,
- wherein said lid holder opens the lid so that said separation promoting unit and said collection unit enter inside the container.
A substrate processing system including a substrate receiving apparatus adapted to receive substrates by being connected with a container which is adapted to house the substrates, and a substrate processing apparatus adapted to perform processing on the received substrates, wherein:
- said substrate receiving apparatus includes a separation promoting unit adapted to promote separation of particles, a collection unit adapted to collect separated particles, and a lid holder adapted to open and close a lid of the container;
- the lid holder opens the lid so that said separation promoting unit and said collection unit enter inside the container connected to said substrate receiving apparatus;
- and
- the substrate processing system further includes a measurement unit adapted to measure an amount of collected particles.
Dependencies are inferred from the claim text.