Megasonic cleaning module

A megasonic cleaning module comprising:

• a vibrator for generating ultrasonic waves;
• a first vibratory rod having a diameter gradually decreased to concentrate the ultrasonic waves generated from the vibrator, the vibrator and first vibratory rod being vertically located above a semiconductor wafer to be cleaned, such that the first vibratory rod is spaced a predetermined distance from one major surface of the semiconductor wafer, for progressing the ultrasonic waves in the longitudinal direction;
• and
• a second vibratory rod coupled at one end to one side of the first vibratory rod at a distal end thereof, such that the second vibratory rod is perpendicular to the first vibratory rod, for progressing the longitudinal ultrasonic waves in the transverse direction on cleaning liquid applied to the surface of the semiconductor wafer to separate foreign matter from the semiconductor wafer, wherein
• the size of the second vibratory rod at the one end where the second vibratory rod is coupled to the first vibratory rod is less than that of the second vibratory rod at the other end thereof, whereby the longitudinal ultrasonic waves operably impart ultrasonic energy into the cleaning liquid.