Cleaning device and a lithographic apparatus cleaning method

A cleaning tool to clean a surface of a component of a lithographic apparatus, the cleaning tool comprising:

• a sonic transducer;
• and
• a liquid outlet removably attachable or sealable to a liquid confinement structure configured to confine liquid between a projection system and a substrate table of the lithographic apparatus during projection of a patterned beam onto a substrate, the liquid outlet configured to remove liquid provided to a reservoir between the surface to be cleaned and the sonic transducer, and positioned substantially towards the center of an area to which the liquid is provided to the reservoir to encourage a radial flow of liquid past the surface to be cleaned to the outlet, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet due to the influence of gravity.