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US 8,011,296 B2Granted
Supercritical fluid-assisted direct write for printing integrated circuits
AssigneeMicron Technology, Inc.
InventorsGurtej Sandhu, Cem Basceri
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Abstract
High resolution patterns provided on a surface of a semiconductor substrate and methods of direct printing of such high resolution patterns are disclosed. The high resolution patterns may have dimensions less than 0.1 micron and are formed by a direct writing method employing a supercritical fluid comprising nanometer-sized particles, which may be optionally electrically charged.
Claims15
A system for the maskless writing of a pattern on a substrate, comprising:
- a support;
- an unmasked substrate supported by the support;
- a discharge assembly for masklessly discharging a solution directly to a surface of the unmasked substrate, the solution comprising nanometer-sized particles dissolved or dispersed in a supercritical fluid;
- and
- a charging device for electrically charging the nanometer-sized particles.
2 more elements
Dependencies are inferred from the claim text.