Method for fabricating narrow magnetic read width TMR/CPP sensors

A method for manufacturing a magnetoresistive sensor, comprising:

• providing a lead layer;
• depositing a series of sensor layers over the lead layer;
• depositing a layer of diamond like carbon (DLC);
• forming a first mask structure over the first layer of DLC, the first mask structure being a trackwidth defining mask structure having first and second openings at either side of a sensor defining track width portion;
• performing a reactive ion etching to remove portions of the first DLC layer that are not protected by the first mask layer;
• performing an ion milling to remove a portion of the series of sensor layers that is not protected by the first mask structure;
• forming a second mask structure having an opening that leaves uncovered the first and second openings of the first mask structure and the sensor defining track width portion;
• depositing a magnetic bias material to a depth such that the top of the hard bias material is located substantially at the level of the top of the series of sensor layers;
• removing the second mask layer;
• and
• performing a chemical mechanical polishing.