Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same

A photomask mounting/housing device for receiving and housing a photomask comprising:

• a single frame body having a concave portion with a shape allowing said photomask to be received and housed and a hollowed portion formed in said concave portion with a shape allowing at least a resist formed region of said photomask to be inserted;
• and
• a translucent protective member disposed outside said hollowed portion of said frame body and forming sealed space so as to be opposite to and be apart from the resist.

A resist inspection method for applying light to a photomask and inspecting a resist of said photomask by receiving reflected light from said photomask, comprising:

• a step of housing said resist of said photomask into a concave portion of a photomask mounting/housing device having a frame body, a hollowed portion with a shape allowing at least a resist formed region of said photomask to be inserted, and a concave portion in said hollowed portion with a shape allowing said photomask to be received and housed, and a translucent protective member disposed outside said hollowed portions of said frame body and forming sealed space so as to be opposite to and be apart from said resist, with said resist of said photomask directed toward said translucent protective member side;
• and
• a step of applying light from said translucent protective member side to perform inspection of said resist.

A resist inspection method for applying light to a photomask and inspecting a resist of said photomask by receiving reflected light from said photomask, comprising:

• a step of housing said resist of said photomask into a concave portion of a photomask mounting/housing device having a single frame body having a concave portion with a shape allowing said photomask to be received and housed and a hollowed portion formed in said concave portion with a shape allowing at least the resist formed region of said photomask to be inserted and a translucent protective member disposed outside said hollowed portion of said frame body and forming sealed space so as to be opposite to and be apart from the resist, with said resist of said photomask directed toward said translucent protective member side;
• and
• a step of applying light from said translucent protective member side to perform inspection of said resist.

A resist inspection apparatus for applying light from an optical system to a photomask placed in a photomask placing portion and receiving reflected light from said photomask to perform inspection of a resist of said photomask, comprising:

• a photomask mounting/housing device to be placed in said photomask placing portion which has a frame body, a hollowed portion with a shape allowing at least the resist formed region of said photomask to be inserted, a concave portion in said hollowed portion with a shape allowing said photomask to be received and housed;
• and
• a translucent protective member disposed outside said hollowed portions of said frame body and forming sealed space so as to be opposite to and be apart from said resist and which houses, in said concave portion, said resist of said photomask, via said hollowed portion, arranged so as to be directed toward said optical system.

A resist inspection apparatus for applying light from an optical system to a photomask placed in a photomask placing portion and receiving reflected light from said photomask to perform inspection of a resist of said photomask, comprising:

• a photomask mounting/housing device to be placed in said photomask placing portion which has a single frame body having a concave portion with a shape allowing said photomask to be received and housed and a hollowed portion formed in said concave portion with a shape allowing at least the resist formed region of said photomask to be inserted and a translucent protective member disposed outside said hollowed portion of said frame body and forming sealed space so as to be opposite to and be apart from the resist and which houses, in its concave portion, resists of said photomask, via said hollowed portion, arranged so as to be directed toward said optical system.