Projection optical system, exposure apparatus, exposure system, and exposure method
AssigneeNikon Corporation
InventorYasuhiro Omura
Life of this patent
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AssigneeNikon Corporation
InventorYasuhiro Omura
Estimating the term…
A projection optical system PL for forming an image of a first plane M on a second plane P has at least one first wedge prism 4 each of an entrance surface and an exit surface of which has a plane and in which a predetermined first wedge angle is made between the plane of the entrance surface and the plane of the exit surface, and when a coordinate system is so defined that a Z-axis direction is set along a direction of a normal to the first plane M, an X-axis direction along a direction of an intersecting line between the plane of the entrance surface and the plane of the exit surface, and a Y-axis direction along a direction perpendicular to the Z-axis direction and the X-axis direction, the first wedge prism 4 is arranged rotatably substantially around the Y-axis direction.
A projection optical system for forming an image of a first plane on a second plane, comprising:
An exposure apparatus for performing exposure of a predetermined pattern on a photosensitive substrate, comprising:
An assembly for use with a projection optical system that forms an image of a first plane on a second plane, comprising:
Dependencies are inferred from the claim text.