Method for manufacturing pixel structure

A method for manufacturing a pixel structure, comprising:

• providing a substrate having an active device formed thereon;
• forming a dielectric layer on the substrate to cover the active device, wherein the dielectric layer has a contact hole disposed over the active device;
• forming a first photoresist layer on the dielectric layer over the active device;
• forming a transparent conductive layer to cover a portion of the dielectric layer and the first photoresist layer, wherein the entire transparent conductive layer is electrically connected to the active device via the contact hole;
• irradiating the transparent conductive layer covering the portion of the dielectric layer and the first photoresist layer with use of a laser beam and removing a portion of the transparent conductive layer on the first photoresist layer, such that the other portion of the transparent conductive layer on the portion of the dielectric layer forms a pixel electrode;
• and
• removing the first patterned photoresist layer after the step of removing the portion of the transparent conductive layer.