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US 8,007,988 B2Granted
Method for manufacturing lens forming master and method for manufacturing thin film transistor substrate using the same
AssigneeSamsung Electronics Co., Ltd.
InventorJung-Mok Bae
Life of this patent
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Abstract
A method for manufacturing a lens forming master includes coating an organic insulation material on a substrate to form an organic insulation layer, removing a portion of the organic insulation layer with a laser which is irradiated through a first mask to form a lens shape on a surface of the organic insulation layer, and removing portions of the organic insulation layer with a laser irradiated through a second mask to form a contact hole and a bank area in the organic insulation layer.
Claims9
A method for manufacturing a thin film transistor substrate, comprising:
- removing a portion of an organic insulation layer with a laser irradiated through a mask to form a lens forming master having a lens shape on a surface of an organic insulation layer;
- coating and hardening an elastic material on the surface of the organic insulation layer and detaching the hardened elastic material from the lens forming master to form an imprinting mold having the lens shape on the surface of the organic insulation layer;
- coating an organic insulation material on a thin film transistor substrate to form a protective layer;
- and
- compressing the surface of the protective layer of the thin film transistor substrate using the imprinting mold to form a shape corresponding to the lens shape of the imprinting mold.
2 more elements
Dependencies are inferred from the claim text.