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US 8,007,960 B2Granted
Light reflecting mask, exposure apparatus, and measuring method
AssigneeKabushiki Kaisha Toshiba
InventorKosuke Takai
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Abstract
A light reflecting mask includes a reflecting layer which is provided on a substrate and reflects light, an absorbing layer which is provided on the reflecting layer and absorbs light, a device pattern which is formed in a first region of the absorbing layer, and a reflectance measuring pattern which is formed in a second region of the absorbing layer. The reflectance measuring pattern is a diffraction grating.
Claims7
A light reflecting mask comprising:
- a reflecting layer which is provided on a substrate and reflects light;
- an absorbing layer which is provided on the reflecting layer and absorbs light;
- a device pattern which is formed in a first region of the absorbing layer;
- and
- a reflectance measuring pattern which is formed in a second region of the absorbing layer,
- wherein the reflectance measuring pattern is a diffraction grating, and
- the reflectance measuring pattern is used for determining degradation of reflectance of the mask.
4 more elements
Dependencies are inferred from the claim text.