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US 8,007,634 B2Granted
Wafer spin chuck and an etcher using the same
AssigneeSemes Co., Ltd.
InventorsJoo-Jib Park, Woo-Young Kim, Woo-Seok Lee
Life of this patent
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Abstract
A wafer spin chuck and an etcher using the same are provided. According to an aspect of the present invention, there is provide a wafer spin chuck device comprising: a spin body which spins a wafer; and a stationary body which holds the spin body and is under the spin body with a space between the spin body and the stationary body, wherein the stationary body includes a blocking unit which blocks the space with a fluid.
Claims11
A wafer spin chuck device comprising:
- a spin body which spins a wafer;
- a spin trunk connected to the spin body;
- and
- a stationary body connected to the spin trunk via a bearing such that the spin body spins around the stationary body via the bearing, wherein a central passage extends through the spin body and stationary body through which a gas flows to prevent a wafer from contacting a surface of the spin body, and wherein a space exists between the spin body and the stationary body that extends from the bearing to the central passage, wherein the stationary body includes a blocking unit and at least one protrusion part positioned within the space between the bearing and the central passage which blocks the space with a fluid.
1 more element
A wafer etcher comprising:
- a process chamber which provides a space for an etching process;
- a wafer spin chuck which spins a wafer in the process chamber, wherein the wafer spin chuck includes a spin body which spins the wafer while the wafer is floated by inert gas, a spin trunk connected to the spin body, and a stationary body connected to the spin trunk via a bearing such that the spin body spins around the stationary body via the bearing, wherein a central passage extends through the spin body and stationary body through which the inert gas flows, and wherein a space exists between the spin body and the stationary body that extends from the bearing to the central passage, and a blocking unit and at least one protrusion part on the stationary body positioned within the space between the bearing and the central passage which blocks the space with a fluid;
- and
- a chemical supply unit which sprays chemical to a surface of the wafer.
1 more element
Dependencies are inferred from the claim text.