Display panel and manufacturing method of display panel
AssigneeCasio Computer Co., Ltd.
InventorsTadahisa Tohyama, Tsuyoshi Ozaki
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Abstract
A manufacturing method of a display panel including a light emitting element including a first electrode, a carrier transporting layer constituted of at least one layer and a second electrode so as to layer the first electrode, the carrier transporting layer and the second electrode, and the manufacturing method includes forming the first electrode in a predetermined region on a substrate, forming an opening from which only a predetermined region of the first electrode is exposed by patterning an insulation film by carrying out an etching after forming the insulation film on the substrate including the first electrode and forming the carrier transporting layer at least on the first electrode which is exposed from the opening.
Claims13
A manufacturing method of a display panel which comprises a light emitting element including a first electrode, a carrier transporting layer constituted of at least one layer, and a second electrode, the method comprising:
- forming the first electrode in a predetermined region on a substrate;
- forming an insulation film, a first semiconductor layer, and a second semiconductor layer in which an impurity is doped so as to cover an entire region of the substrate on which the first electrode is formed, wherein the insulation film, the first semiconductor layer, and the second semiconductor layer are layered in this order;
- forming an opening from which only a predetermined region of the first electrode is exposed by continuously patterning the second semiconductor layer, the first semiconductor layer, and the insulation film with an etching gas;
- and
- forming the carrier transporting layer at least on the first electrode which is exposed from the opening.
A manufacturing method of a display panel which comprises a light emitting element including a first electrode, a carrier transporting layer constituted of at least one layer, and a second electrode, the manufacturing method layering the first electrode, the carrier transporting layer and the second electrode, the manufacturing method comprising:
- forming the first electrode in a predetermined region on a substrate;
- forming an insulation film, a first semiconductor layer, and a second semiconductor layer in which an impurity is doped so as to cover an entire region of the substrate on which the first electrode is formed, wherein the insulation film, the first semiconductor layer, and the second semiconductor layer are layered in this order;
- removing the insulation film, the first semiconductor layer, and the second semiconductor layer which are on the first electrode by continuously patterning the second semiconductor layer, the first semiconductor layer, and the insulation film with an etching gas;
- forming the carrier transporting layer on the first electrode;
- and
- forming the second electrode on the carrier transporting layer.
Dependencies are inferred from the claim text.